There are also such abrasives! GC, DIA, and B4C are always in a dispersed state!
In addition to the existing cerium, GC, DIA (MC/PC), and B4C have joined the group. The work and applications have expanded.
◎ Depending on the work and desired results, you can choose abrasives from GC, diamond (single crystal, polycrystalline), or boron. ◎ No need for slurry formulation, maintaining high dispersion for a long time. ◎ Produces a uniform polishing surface with minimal processing unevenness. ◎ Moderate viscosity makes it easy to supply to production lines, with no reduction in rate due to excessive dispersants. ◎ Prevents aggregation of fine particles, allowing effective abrasives to act for extended periods, reducing the amount of abrasives used and decreasing waste (industrial waste). ◎ No special cleaning solution is required; it can be cleaned with water. ◎ Can be easily used for on-site repair polishing. ◎ Please feel free to inquire about available concentrations and quantities.
- Company：アウトラン
- Price：Other
